Radiation blistering of Nb Implanted sequentially with helium ions of different energies (3–500 keV)

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Blistering of H-implanted GaN

Mechanisms of blistering of wurtzite GaN films implanted with H ions are studied. In particular, we report on the influence of the following parameters on the blistering process: ~i! ion energy ~from 20 to 150 keV!, ~ii! ion dose ~up to 1.2310 cm!, ~iii! implantation temperature ~from 2196 to 250 °C!, and ~iv! annealing temperature ~up to 900 °C!. Results show that both the onset of blistering ...

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ژورنال

عنوان ژورنال: Journal of Nuclear Materials

سال: 1976

ISSN: 0022-3115

DOI: 10.1016/0022-3115(76)90217-8